MILPITAS, Calif., Feb. 06, 2018 (GLOBE NEWSWIRE) --
Nanometrics Incorporated (NASDAQ:NANO), a leading provider of advanced process control systems, today announced that its IMPULSE®+ integrated metrology platform has been selected for high-volume process control at a leading-edge DRAM manufacturer. With this selection, the IMPULSE+ with NanoDiffract® software is providing insight for transistor, storage node, and interconnect advanced process control for sub-20nm DRAM devices. These systems will be deployed in conjunction with Atlas® III automated systems to provide a comprehensive fab-wide process control solution.
“The IMPULSE+ supports the high throughput and precision needed for advanced metrology applications,” commented Nir Ben-Moshe, senior director of integrated metrology solutions at Nanometrics. “Our systems are qualified on the leading chemical mechanical polishing (CMP) systems, providing rapid feedback for advanced process control. As DRAM cell densities increase and minimum pitch sizes decrease, precise control of transistor, storage node, and copper damascene polish is critical to device yield and performance. The IMPULSE+ with NanoDiffract provides this control with advanced thin film and optical critical dimension (OCD) metrology. When deployed together, the IMPULSE+ and Atlas III leverage common hardware and software technologies, providing results with the highest accuracy and fastest time-to-solution.”
The IMPULSE+ works in conjunction with Nanometrics’ NanoDiffract software suite, for OCD modeling and control as well as part of a larger fleet of IMPULSE, Trajectory™ T3 and Atlas® family of systems, to provide comprehensive fab-wide control. Nanometrics is the industry pioneer in integrated metrology with the broadest suite of offerings, which are qualified on platforms for CMP, deposition, lithography track and etch systems. The IMPULSE+ can be deployed across key steps in memory, logic, sensor, and other device manufacturing.
About Nanometrics
Nanometrics is a leading provider of advanced, high-performance process control metrology and inspection systems used primarily in the fabrication of semiconductors and other solid-state devices, including sensors, optoelectronic devices, high-brightness LEDs, discretes and data storage components. Nanometrics' automated and integrated metrology systems measure critical dimensions, device structures, topography and various thin film properties, including three-dimensional features and film thickness, as well as optical, electrical and material properties. The company's process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced three-dimensional wafer-level packaging applications. Nanometrics' systems enable advanced process control for device manufacturers, providing improved device yield at reduced manufacturing cycle time, supporting the accelerated product life cycles in the semiconductor and other advanced device markets. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Select Market under the symbol NANO. Nanometrics' website is http://www.nanometrics.com.
Forward Looking Statements
Certain statements in this press release are forward-looking statements that involve a number of risks and uncertainties that could cause actual results to differ materially from those described in this release. Although Nanometrics believes that the expectations reflected in the forward-looking statements are reasonable, actual results could differ materially from these expectations due to a variety of factors, including, but not limited to: Nanometrics’ inability to ship products as scheduled or achieve customer acceptance of new products; shifts in the timing of customer orders and product shipments; and general economic conditions. For additional information and considerations regarding the risks faced by Nanometrics that could cause actual results to differ materially, see its annual report on Form 10-K for the year ended December 31, 2016, as filed with the Securities and Exchange Commission on March 3, 2017 including under the caption “Risk Factors,” as well as other periodic reports filed with the SEC from time to time. Nanometrics disclaims any obligation to update information contained in any forward-looking statement, except as required by law.