ASML terminates licences for optical maskless lithography for semiconductor applications

ASML terminates licences for optical maskless lithography for semiconductor
applications


Täby, Sweden - April 16, 2009 - Micronic Laser Systems AB (OMX Nordic Exchange
Stockholm, Nordic list, Small Cap, Information Technology: MICR) and ASML
Netherlands B.V. signed in December 2004 
a license agreement giving ASML the right to market optical maskless lithography
for semiconductor applications based on Micronic's patent portfolio in the SLM
(Spatial Light Modulator) and data path technology.


ASML has terminated its licenses.

This means that Micronic regains the right to fully use the above mentioned
patents at its own discretion. Micronic's right to use ASML's development of the
SLM technology for photomask applications continues. Micronic shall repay an
advance payment of royalties amounting to 13 MEUR. The advance payment is
interest-bearing and the repayment does not affect Micronic's net cash and will
have no impact on Micronic's result. 


Company contact:				 	
Sven Löfquist	
President & CEO	
Tel: +46 8 638 52 00	
sven.lofquist@micronic.se



About Micronic Laser Systems AB
Micronic Laser Systems is a Swedish high-tech company engaged in the
development, manufacture and marketing of a series of extremely accurate laser
pattern generators for the production of photomasks. The technology involved is
known as microlithography. Micronic´s product offering also includes metrology
systems for display photomasks. Micronic´s systems are used by the world´s
leading electronics companies in the manufacture of television and computer
displays, semiconductor circuits and semiconductor packaging components.
Micronic is located in Taby, north of Stockholm and at present has subsidiaries
in the United States, Japan, South Korea and in Taiwan. Micronic maintains a web
site at: http://www.micronic.se